[电子]辉光放电

glow discharges───[电子]辉光放电

to discharge───放电；还债；辞退，解雇

air discharge───n.排气；空气放电；空气排放量

to mischarge───弄错

corona discharge───[物]电晕放电

brush discharge───[电]刷形放电

nasal discharge───鼻涕；流鼻涕

corona discharges───[物]电晕放电

general discharge───一般放电

The samples were deposited on c - Si substrates by glow discharge inH _ 2 and SiCl _ 4 mixture.───样品是在H_ 2和SiCl_4混合气体中用辉光放电方法淀积在晶体硅(c-Si)衬底上的.

simplest discharge to produce is the glow discharge.───最简单的放电产生方法是辉光放电。

The research progress and generation mechanism of atmospheric pressure glow discharge plasma ( APGDP ) were reviewed.───综述了常压辉光放电等离子体 ( APGDP ) 的产生机理及研究进展.

MHCD can as plasma cathode for high - pressure glow discharge to solve the instability of glow - to - arc transition .───将 MHCD 作为大体积辉光放电的外部电子源,可以解决高气压下大体积辉光放电不稳定的问题.

The analyzed results indicate that it is abnormal glow discharge.───分析表明,放电处于异常辉光区.

Cathode temperature is one of the most important factors influencing the stability of high current glow discharge.───阴极的温度是影响大电流辉光放电稳定工作的重要因素。

Microhollow cathode discharge ( MHCD ) is a novel, nonequilibrium , high - pressure, direct current glow discharge.───微空心阴极 放电 是一种新颖的 、 非平衡 、 高气压辉光放电.

Simultaneous multielement determination for superalloy by glow discharge optical emission spectrometry ( GDOES ) was investigated.───研究了用辉光光谱法 ( GDOES ) 同时测定高温合金中的多种元素的含量.

The crystal growth by glow discharge sputterings and ion beam sputterings and thecrystal epitaxy are introduced.───介绍了气相中晶体生长的方法,如辉光放电溅射法和离子束溅射沉积法以及晶体外延生长的方法.

Contact glow discharge electrolysis is a novel type of electrochemical process.───接触辉光放电电解是一种新型的产生等离子体的电化学方法.

discharge characterized by a cathode fall that is small compared with that in a glow discharge.───与辉光放电相比，阴极位降相对较低的放电形式。

The simplest discharge to produce is the glow discharge.───最简单的放电产生方法是辉光放电.

An ozone generator with glow discharge tube has been developed by using glass as dielectric material.

Contact glow discharge electrolysis is a novel type of electrochemical process.

In AC electrical field, the stable homogeneous glow discharge will appear by using dielectric barrier layer and high-frequency power source.

Hot cathode glow discharge plasma chemical vapor deposition is a new method to deposit high-quality diamond films with high deposition rate.

Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.

Comparing with the conventional cold glow discharge, the hot cathode glow discharge is a new type of gas discharge.

Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently.

The crystal growth by glow discharge sputterings and ion beam sputterings and thecrystal epitaxy are introduced.

The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.